Deposition of submicron particles in deep bed filtration under unfavorable conditions
Jegatheesan, Veeriah, Vigneswaran, Saravanamuth, and Lee, Seung-Hwan (2005) Deposition of submicron particles in deep bed filtration under unfavorable conditions. Korean Journal of Chemical Engineering, 22 (1). pp. 142-146.
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View at Publisher Website: http://dx.doi.org/10.1007/BF02701476
Deterioration in the filter removal efficiency of submicron particles (λ/λo) under unfavorable surface conditions is affected by the number of deposited particles per filter grain. In the case of above micron particles, the deterioration of filter removal efficiency has been mainly due to the blocking effect of deposited particles and not by the number of deposited particles. Deposition of large number of submicron particles changed the surface characteristics of collectors (filter grain associated with deposited particles) and enhanced unfavorable surface conditions. Filtration experiments were conducted with monodispersed suspensions of known sizes of submicron latex particles at different ionic strengths, using glass beads as filter grains. The filtration performance was predicted by using a mathematical model, assuming a linear relationship between λ/ λo and Σ (i.e. λ/λo=1 − kΣ). For both particles, k was found to decrease andλ o was found to increase with the increase in the ionic strength. A comparison was made of the importance of blocking effect for the filtration of submicron particles.
|Item Type:||Article (Refereed Research - C1)|
|Keywords:||blocking effect; deep bed filtration; filter coefficient; specific deposit; submicron latex particles|
|FoR Codes:||09 ENGINEERING > 0904 Chemical Engineering > 090404 Membrane and Separation Technologies @ 80%|
09 ENGINEERING > 0907 Environmental Engineering > 090702 Environmental Engineering Modelling @ 20%
|SEO Codes:||96 ENVIRONMENT > 9609 Land and Water Management > 960999 Land and Water Management of Environments not elsewhere classified @ 100%|
|Deposited On:||19 Mar 2010 14:24|
|Last Modified:||18 Oct 2013 00:50|
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