Microwave characterization of a novel, environmentally friendly, plasma polymerized organic thin film

Abstract

Polymerized Linalyl Acetate (PLA) thin films were fabricated using RF plasma polymerization. The dielectric properties of the PLA thin films have been investigated using the split post dielectric resonance technique, which consists of a silver coated copper cavity and two precisely machined identical dielectric materials. The measurements have been carried out at resonance frequencies of 10 GHz and 20 GHz, with good agreement between results. The dielectric properties were also investigated at low frequencies using capacitive measurements of MIM structures. All methodologies place the dielectric constant of the PLA material at approximately 2.4, indicating the material is suitable for use in electronics as an insulating layer.