Parallel and serial generated patterned DLC surfaces for creating three-dimensional polymeric stamp structures

Abstract

This study demonstrates pattern generation on a highly durable and flat diamond-like-carbon (DLC) film with micro/nano-scale resolution using the Atomic Force Microscope (AFM). Parallel processing (masked lithography) and serial local probe processing (maskless lithography) have both been utilized to produce a range of structure shapes at different length scales. The AFM is operated in the electrical conductivity mode which induces oxidation on the DLC surface. The technique offers features with structure depths as small as 20 nm (serial processing) and pattern replication of many centimeters (parallel processing). Moreover parallel processed structures may be further modified via serial patterning using the same instrumentation. As a result, complex shapes can be produced with a depth being controlled by the DLC film thickness and/or by the bias voltage parameters. The patterned DLC structures can be used as a template for fabrication of 3 dimensional polymeric structures.